PhD Position in Atomic Layer Deposition for Sensing Applications

The project will be carried out both at the TU/e and Holst Centre at roughly a 50%-50% time base. ALD tools, thin-film analysis techniques and other materials processing steps as well as device integration and characterization tools are available for employment at both locations. 

Atomic layer deposition (ALD) is a method to synthesize ultrathin and conformal films with an excellent control of thickness and material properties. The method relies on alternate pulsing of two or more precursor vapors into a vacuum chamber. The subsequent saturative and self-limiting chemisorption reactions of these vapors on the substrate surface lead to the deposition of one submonolayer of film per deposition cycle. 

Since the recent introduction of ALD in mainstream CMOS production by Intel

the interest in ALD has greatly increased, especially due to its potential to sustain the continuous decrease of device dimensions in the semiconductor industry. Many more new application domains can, however, benefit from the unique characteristics provided by ALD such that new devices and other applications can be realized. At the same time new processing challenges need to be met, for example due to the need for new material systems, the use of new (non-semiconductor) substrate materials, the application of demanding surface topographies, and the demands on a wider range of processing conditions. 

The current project focuses on the synthesis of ALD materials for sensing applications. The project involves the development of new ALD processes, the study of the underlying surface reactions, the characterization of the materials, as well as the implementation of the material in device structures and the characterization of these devices. The PhD student will have access to state-of-the-art ALD and other processing equipment (thin film technologies, etching tools, and nanopatterning techniques) in modern clean room facilities as well as to an extensive set of surface and material analysis techniques and device characterization equipment.   

Setting and start of the project: The project will be carried out both at the TU/e and Holst Centre at roughly a 50%-50% time base. ALD tools, thin-film analysis techniques and other materials processing steps as well as device integration and characterization tools are available for employment at both locations. 

For all inquiries, please contact:

Linda Bouwens-Oosterbosch
Human Resource Advisor, imec
Tel.: +31 (0)40 40 20 518
Email: talent@imec-nl.nl

Dr.ir. W.M.M. (Erwin) Kessels
Group Plasma and Material Processing, Eindhoven University of Technology
Tel.: +31 (0)40 247 3477/4880
Email: w.m.m.kessels@tue.nl

Prof.dr. Fred Roozeboom
Group Plasma and Material Processing, Eindhoven University of Technology
Tel.: +31 (0)40 247 4369/4880
Email: f.roozeboom@tue.nl

Apply now